Tier-1 Semiconductor Fabrication Facility Hwaseong ZEISS AIMS32-193i DVIA-P4000 Installation Report
Contents
Overview
Tuning and vibration measurement were performed on the DVIA-P4000 installed at Tier-1 Semiconductor Fabrication Facility Hwaseong NRD Line.
Tuning and vibration measurement were conducted with the equipment installed / IDLE.
On November 10, 2025 during inspection, part of the access floor around the isolator was in contact with the isolator. Such structural interference is a factor that directly and strongly affects isolator performance.
A booth structure was connected adjacent to the equipment installed on the isolator, and strong vibration from that booth was observed continuously. Such vibration may affect isolator performance and vibration measurement results.
Before and after inspection data were compared.
Data are presented as VC curves with reference materials for vibration level assessment.
Vibration Isolation System Information
Model: DVIA-P4000
Serial Number: 016147
Engineer
Chaewon Lee from DAEIL SYSTEMS
Measurement Date
December 8, 2025
Installation Site
Tier-1 Semiconductor Fabrication Facility Hwaseong NRD Line
End User
Tier-1 Semiconductor Fabrication Facility
Equipment Information
Manufacturer: ZEISS
Equipment: Photomask Qualification
Model: AIMS32-193i
Equipment Specifications
VC-C
Equipment Status
Equipment installed / IDLE
Measuring Equipment
Data Physics DAQ
Hardware: QUATTRO, Serial Number: 22436
Software: SignalCalc ACE
Accelerometer
PCB Accelerometer
Model: 393B05
Measuring Set-up
F Span: 200 Hz
Lines: 3200
Engineering Units: m/s
Window: Hanning
Averaging: FFT Spectrum Averaging
Averaging mode: Exponential, 40
Conclusion
At the initial inspection, part of the access floor was in contact with the isolator; in this condition, measurements were SPEC Out in all directions.
After isolator tuning, measurement results satisfy the SPEC in all directions.
Measurement Data
| Measuring Point | Status | Direction | Spec | Measurement (before tuning) | Measurement (after tuning) | Result (before tuning) | Result (after tuning) |
|---|---|---|---|---|---|---|---|
| Tier-1 Semiconductor Fabrication Facility Hwaseong NRD Line 1. Before tuning 2. After tuning | Equipment installed / IDLE | Vertical | VC-C | VC-B @ 12.5 Hz | VC-C @ 12.5 Hz | ✗ FAIL | ✓ PASS |
| Left to Right | VC-B @ 12.5 Hz | VC-C @ 12.5 Hz | ✗ FAIL | ✓ PASS | |||
| Front to Back | VC-A @ 12.5 Hz | VC-C @ 12.5 Hz | ✗ FAIL | ✓ PASS |
Data and Image
Vertical VC Curves
Vertical Autospectrum
Left to Right VC Curves
Left to Right Autospectrum
Front to Back VC Curves
Front to Back Autospectrum
Reference
Generic Vibration Criteria
Notes:
1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.
2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.
