Installation Report

DVIA-M Series

01-06-2026

Tier-1 Semiconductor Cheonan C5 ZEISS Versa Gemini SEM 460 DVIA-ML1000 Installation Report

DVIA-M Series

Installation Report

Tier-1 Semiconductor

Cheonan

ZEISS

Gemini SEM 460

FE-SEM

DVIA-ML1000

Overview

Tuning and vibration check for DVIA-ML1000 on the YEC FE-SEM line at Tier-1 Semiconductor Cheonan campus C5 Analysis Room 1, unit 5. Work performed with the tool Turned On / IDLE and normal operation confirmed.

Public case policy: per customer data-handling rules, no images are published here (no measurement plots and no handout/screen captures).

The isolator and measurement workflow met the stated VC goals in the on-site report, and a ZEISS engineer confirmed the SEM is imaging under normal use.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial number: 251015R4

Engineer

Seongyoon Jeong — DAEIL SYSTEMS (field / development, per report)

Measurement / service date

December 15, 2025

Report date

January 6, 2026

Installation site

Cheonan campus C5 Analysis Room 1

End user

Tier-1 Semiconductor

Equipment

Manufacturer: ZEISS — FE-SEM — Model: Versa Gemini SEM 460

Vibration specification (equipment)

Vertical: VC-D

Horizontal: VC-E

Equipment status

Turned On / IDLE during the session

Measurement device

Brüel & Kjær LAN-XI DAQ Type 3050 (Front End 3050-A-040), PULSE LabShop 22

Accelerometer: PCB, Model 393B05

Measurement setup (field report)

F Span: 200 Hz, Lines: 3200, Spectrum averaging, m/s, Hanning, Overlap: Max

Conclusion (field report)

In all directions, levels met the VC criteria in the on-site report; a ZEISS engineer verified normal SEM imaging for the end customer.

Data and image

Not published in this public case: autospectrum, VC, transmissibility plots, and any handout/screen images (per customer data-handling policy).

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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