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Installation Report
DVIA-ULF Series
12-31-2025

Tier-1 Semiconductor Fabrication Facility DSR C Tower 3F Research Lab ZEISS VersaXRM 730 DVIA-ULF1500 Installation Report

DVIA-ULF Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
ZEISS

Overview

Tuning and vibration measurements were performed on the DVIA-ULF1500 installed at Tier-1 Semiconductor Fabrication Facility DSR C Tower, 3rd floor research laboratory.

Tuning and vibration measurements were conducted with the equipment Turned on/IDLE.

Data is presented as VC Curves, with reference materials on vibration levels.

Vibration Isolation System Information

Model: DVIA-ULF1500

Serial Number: 250815R2

Engineer

Chaewon Lee from DAEIL SYSTEMS

Measurement Date

December 31, 2025

Installation Site

Tier-1 Semiconductor Fabrication Facility DSR C Tower, 3rd floor research laboratory

End User

Tier-1 Semiconductor Fabrication Facility

Equipment Information

Manufacturer: ZEISS

Equipment: X-ray Microscope

Model: VersaXRM 730

Equipment Specification

VC-C

Equipment Status

Equipment installed and Turned on/IDLE

Measuring Equipment

10.1) Data Physics DAQ

Hardware: QUATTRO, Serial Number: 22436

Software: SignalCalc ACE

10.2) Accelerometer

PCB Accelerometer

Model: 393B05

Measuring Set-up

F Span: 200 Hz

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Averaging mode: Exponential, 40

Conclusion

Vibration specifications are satisfied in all directions.

Measurement Data

Measuring pointStatusVibration specDirectionFloorDVIA-ULF1500FloorDVIA-ULF1500
Tier-1 Semiconductor Fabrication Facility DSR C Tower 3F
Research Lab
1. Floor vibration
2. DVIA-ULF1500
Turned on/IDLEVC-CVerticalVC-B
@ 10 Hz
VC-D
@ 10 Hz
FAILPASS
Left to RightVC-E
@ 8 Hz
VC-G
@ 8 Hz
PASSPASS
Front to BackVC-D
@ 8 Hz
VC-F
@ 8 Hz
PASSPASS

Data and Image

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC Curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date12-31-2025
Tags
DVIA-ULF Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
ZEISS