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Installation Report
DVIA-M Series
01-07-2026

ZEIS FIB-SEM Crossbeam 550 DVIA-ML1000 (241104R1) Installation Report

DVIA-M Series
Installation Report
ZEISS
FIB-SEM
Crossbeam 550
DVIA-ML1000
241104R1

Overview

The DVIA-ML1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 241104R1

Engineer

Chaewon Lee

Tuning Date

25.12.19

Report written date

26.01.07

End User

N/A

Number of Tuning Trial

1st

Location

N/A

Equipment

Manufacturer: ZEIS

Equipment: FIB-SEM

Model: Crossbeam 550

Vibration Specification

Equipment Condition

The equipment is turned on/IDLE

Measurement Summary

Measurement PointStatusAxisMeasurement Data
FloorDVIA-ML1000
1.Floor 2.DVIA-ML1000Crossbeam 550 is turned on/IDLEVerticalVC-E @ 50 HzVC-G @ 50 Hz
Left to RightVC-G @ 3.15 HzVC-G @ 3.15 Hz
Front to BackVC-G @ 3.15 HzVC-G @ 3.15 Hz

Data and Image

Figure

Vertical Transmissibility

Vertical Transmissibility

Left to Right Autospectrum

Left to Right Autospectrum

Front to Back VC Curves

Front to Back Transmissibility

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date01-07-2026
Tags
DVIA-M Series
Installation Report
ZEISS
FIB-SEM
Crossbeam 550
DVIA-ML1000
241104R1