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Installation Report
DVIA-M Series
05-12-2026

Unisoku USM1400 STM DVIA-MB3000 Installation Report

DVIA-M Series
Installation Report
Unisoku
STM
USM1400

Contents

Overview

The DVIA-MB3000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-MB3000

Serial Number: 240228R1

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

May 07, 2026

Report written date

May 12, 2026

End User

Mianyang Ninth Hospital

Number of Tuning Trial

1st

Location

Mianyang City, China

Equipment

Manufacturer: Unisoku

Equipment: STM

Model: USM1400

Vibration Specification

N/A

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

Measurement Summary

Measurement PointStatusAxisFloorDVIA-MB3000
1.Floor
2.DVIA-MB3000		Equipment is Turned on/IDLEVerticalVC-C
@ 3.15 Hz		VC-F
@ 3.15 Hz
Left to RightVC-D
@ 50 Hz		VC-G
@ 50 Hz
Front to BackVC-D
@ 20 Hz		VC-G
@ 20 Hz

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Photography was not permitted.

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date05-12-2026
Tags
DVIA-M Series
Installation Report
Unisoku
STM
USM1400

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