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Installation Report
DVIA-M Series
02-12-2015

Banwol Hi-Tech 4F — Daeil Analysis Research Institute — DVIA-M1000 (M1000 P10) vibration survey — 2015-02-12

DVIA-M Series
Installation Report
Daeil Systems
Banwol Hi-Tech
DVIA-M1000
M1000 P10
TESCAN
VAAV

Site and report title

Vibration environment measurement results (Banwol Hi-Tech 4F, Daeil Analysis Research Institute)

Overview

To determine whether the vibration environment satisfies equipment use requirements after installation of the M-1000 P10 vibration isolation platform.

Measurement date: Wednesday, 12 February 2015. Measurers: Seongwon Choi, Jongwook Lim.

Measurement conditions and results

TESCAN equipment is mounted on the platform. The equipment’s internal active isolator is floated only; the entire tool set remains off.

Sensors are placed on the front of the platform top (top) and on the floor in front of the platform (base), with no deliberate excitation applied during the measurement.

Measurement setup

Summary of measurement results

State: ACTIVE

Test DirectionBaseTop
ZCG
XEG
YEG

The isolator intrinsic performance is favorable.

With active control, the platform-top vibration environment is favorable at G class.

VAAV program measurement results

FFFZ

FFFX

FFFY

OCTAVE BAND

Active Z

The issuance handout includes a 1/3 octave band chart for the active Z condition (velocity, top and base traces with VC reference overlays) as a vector chart only; no separate bitmap is published on this page.

Active X

The issuance handout includes a 1/3 octave band chart for the active X condition (velocity, top and base traces with VC reference overlays) as a vector chart only; no separate bitmap is published on this page.

Active Y

The issuance handout includes a 1/3 octave band chart for the active Y condition (velocity, top and base traces with VC reference overlays) as a vector chart only; no separate bitmap is published on this page.

Reference

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm line widths.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

2. Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date02-12-2015
Tags
DVIA-M Series
Installation Report
Daeil Systems
Banwol Hi-Tech
DVIA-M1000
M1000 P10
TESCAN
VAAV