Nanfu Battery Hitachi SU1000 FlexSEM 1000II DVIA-UB350 (201021R4 P1) YIMO Remote-Tuning Report

DVIA-ULF Series

Installation Report

Remote tuning

YIMO

Nanfu Battery

Hitachi

FlexSEM

DVIA-UB350

201021R4

Installation and end user

Field	Value
Target equipment	Hitachi SU1000 FlexSEM 1000II
Place of installation	Nanping city,4F
Remark	Good Performance
END USER	南孚电池

Operator and dates

Operator: Munho Noh Date of setup : 21.02.22 Date of reporting : 21.02.22	Date of business trip : 17.12.27~17.12.29

Overview

Overview After Active mounting, measure the vibration environment to check that there is no problem in using the equipment. Measurement date: 21.02.22 (MON) Operator: Daeil System, Research engineer Munho Noh Place of measurement : Nanping city,4F Equipment Model: Hitachi SU1000 FlexSEM 1000II Measurement conditions and results Summary of measurement results Good omnidirectional performance.

Transmissibility (Test Condition)

	2 Hz	10 Hz
Z	-10.2 dB	-35.29 dB
X	-7.37 dB	-32.32 dB
Y	-8.866 dB	-32.56 dB

MB1000 internal program performance measurement result

N/A

Z axis

X axis

Y axis

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A