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Installation Report
DVIA-M Series
12-16-2019

Northwest Polytech University ZEISS GeminiSEM 300 DVIA-MB1000 Installation Report (190123R1, 2019-12-16)

DVIA-M Series
Installation Report
Northwest Polytech University
DVIA-MB1000
ZEISS
GeminiSEM 300
SEM
190123R1

Contents

Northwest Polytech University

(MB1000_190123R1 Set up)

Site checklist

Target equipmentZEISS GeminiSEM300
Place of installation1F 126 SEM&TEM Room, Qixiang Building, Northwest Polytech University
RemarkGood Performance
END USERNorthwest Polytech University

Operator and dates

Operator: Choi, Sung Won

Date of setup : 19.12.12

Date of reporting : 19.12.16

Date of business trip : 17.12.27~17.12.29

Overview

After Active mounting, measure the vibration environment to check that there is no problem in using the equipment.

Measurement date: 2019.12.12 (Thursday),

Operator: Daeil System, Manager Sung Won Choi

Place of measurement : 1st Floor, Qixiang Building, Northwest Polytech University

Equipment Model: ZEISS GeminiSEM300

Measurement conditions and results

Summary of measurement results

Test ConditionVC-Class
ZXY
FloorEGG
Above ActiveGGG

Good omnidirectional performance.

MB1000 internal program performance measurement result

MB1000 internal program — Z axis

MB1000 internal program — X axis

MB1000 internal program — Y axis

Octave Band Result (BASE: Floor, TOP: Above Active)

Octave Band Result — Z axis

Octave Band Result — X axis

Octave Band Result — Y axis

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date12-16-2019
Tags
DVIA-M Series
Installation Report
Northwest Polytech University
DVIA-MB1000
ZEISS
GeminiSEM 300
SEM
190123R1

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