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Installation Report
DVIA-M Series
11-13-2017

ZEISS SIGMA 300 DVIA-MB1000 (MB1000_P53) Internal program — Tier-1 Semiconductor — Philippines — 2017.11.13

DVIA-M Series
Installation Report
Tier-1 Semiconductor
Philippines
Manila
ZEISS
SIGMA 300
DVIA-MB1000
MB1000_P53
P53

Contents

Installation site photo

(MB1000_P53 Set up)

타겟 장비ZEISS-SIGMA 300
설치장소Tier-1 Semiconductor analysis laboratory, 2nd floor, Manila, Philippines
특이사항제진대 성능 양호
END USERTier-1 Semiconductor

출장일 : 17.11.07~17.11.11

출장자 : 최형문

작성일 : 17.11.13

Overview

제진대 설치 후 진동환경을 측정하여 장비 사용에 문제가 없는지 확인함.

Measurement date

측정일: 2017. 11. 08 (화), 측정자: 대일시스템 최형문 과장

Place of measurement

측정장소 : Tier-1 Semiconductor analysis laboratory, 2nd floor, Manila, Philippines

Equipment Model

장비 모델 : ZEISS-SIGMA 300

Measurement conditions and results

Summary of measurement results

Test ConditionVC-Class (일반 조건) ZVC-Class (일반 조건) XVC-Class (일반 조건) Y
건물 바닥CCC
제진대 상판GGG
SIGMA 300 상부GGG

전 방향 성능이 양호하며, VC-Class그래프를 첨부함.

측정 조건은 일반 조건( SEM 펌프 가동 )과 평상시 조건( SEM/코팅기 펌프 가동/사람이 걸어 다닐 때)으로 측정함.

주변 펌프가 작동하거나 사람이 돌아다니는 등 환경이 변화해도 제진대 상부의 진동 환경에는 큰 영향을 주지 않음.

이미지 측정시 고객 성능 만족함.

MB1000 internal program performance measurement result

Z axis

X axis

Y axis

Octave Band Result (BASE: 바닥, TOP: 제진대 상부)

Octave band Z axis (floor vs isolator top)

Octave band X axis (floor vs isolator top)

Octave band Y axis (floor vs isolator top)

Octave Band Result (BASE: 제진대 상부, TOP: 자이스장비)

Octave band Z axis (isolator vs ZEISS equipment)

Octave band X axis (isolator vs ZEISS equipment)

Octave band Y axis (isolator vs ZEISS equipment)

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date11-13-2017
Tags
DVIA-M Series
Installation Report
Tier-1 Semiconductor
Philippines
Manila
ZEISS
SIGMA 300
DVIA-MB1000
MB1000_P53
P53

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