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Installation Report
DVIA-P Series
07-05-2017

Samsung Electro-Mechanics Suwon facility vibration environment measurement — 2017-07-05

DVIA-P Series
Installation Report
Samsung Electro-Mechanics
Suwon
Vibration measurement

Contents

Schedule and field engineer

Setup date: 30 June 2017 (Fri)

Field engineer: Lim Jong-wook, DAEIL SYSTEMS

Report date: 5 July 2017 (Wed)

Installation result summary

Test directionVC-Class (floor)VC-Class (above active isolation platform)
ZBF
XDF
YEF

Overall performance is favorable in all directions.

Floor vibration was measured as VC-Class B on vertical Z, D on horizontal X, and E on horizontal Y.

With the active isolation platform in use, vibration above the platform was measured as VC-Class F in all directions.

Vertical floor vibration at the site is relatively high; using the active isolation platform visibly attenuates vibration.

Vibration environment measurement results

Site measurement photograph (Samsung Electro-Mechanics Suwon)

Z axis (1/3 octave band, floor vs isolated platform)

X axis (1/3 octave band, floor vs isolated platform)

Y axis (1/3 octave band, floor vs isolated platform)

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-P Series
Date07-05-2017
Tags
DVIA-P Series
Installation Report
Samsung Electro-Mechanics
Suwon
Vibration measurement

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