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Installation Report
DVIA-M Series
10-06-2016

Samsung Electro-Mechanics Cheonan — Hitachi SEM SU8010 vibration environment measurement (MB1000_P34) — 2016-10-06

DVIA-M Series
Installation Report
Samsung Electro-Mechanics
Cheonan
Hitachi
SU8010
MB1000
Vibration measurement

Contents

Schedule and field engineer

Trip date: 2016-10-05 (Wednesday)

Report date: 2016-10-06 (Thursday)

Field engineer: Lim Jong-wook, DAEIL SYSTEMS

Overview

After installing the vibration isolation platform, vibration conditions were measured to verify there were no issues for equipment operation.

Measurement conditions and results

Measurement date: 2016-10-05 (Wednesday). Measuring engineer: Lim Jong-wook, DAEIL SYSTEMS.

Measurement site: Samsung Electro-Mechanics, Cheonan

Equipment model: HITACHI SEM (SU8010)

Vibration isolation platform: MB1000_P34

Measurement condition: Measured the vibration isolation platform top plate and the research-building floor.

Test conditionZXY
FloorCEE
Above vibration isolation platform top plateGGG

With the vibration isolation platform installed, the floor was measured at VC-Class C on Z, E on X, and E on Y.

Above the vibration isolation platform top plate: VC-Class G in all directions.

VC-Class graphs are attached.

Vibration environment VC-Class graphs

Equipment context (Hitachi SEM SU8010)

Vertical axis (Z) vibration level

Horizontal axis (X) vibration level

Horizontal axis (Y) vibration level

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date10-06-2016
Tags
DVIA-M Series
Installation Report
Samsung Electro-Mechanics
Cheonan
Hitachi
SU8010
MB1000
Vibration measurement

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