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Installation Report
DVIA-M Series
12-29-2014

Hanyang University FEI SEM DVIA-MB1000 (MB1000 P8) vibration environment measurement — 2014-12-29

DVIA-M Series
Installation Report
DVIA-MB1000
MB1000
P8
FEI
SEM
Hanyang University
College of Engineering

MB1000 P8 vibration environment measurement report (Hanyang University College of Engineering)

Overview

Purpose of verifying whether the vibration environment satisfies the customer's requirements after application of the MB1000 P8 vibration isolation platform.

Measurement date/time: 2014. 12. 29 (Monday) 15:30 — Measurer: Choi Sung-won.

Measurement site: Hanyang University College of Engineering.

4. Measurement conditions and results

Measurement state: FEI SEM installed; onboard equipment inactive (built-in passive and instrument functions off).

Planning to add acoustic enclosure and EMI cancellation equipment implies possible ambient changes afterward.

Measurements were carried out at the front-center of the vibration isolation tabletop and at the front floor (base), without shaker excitation.

VC-Class summary graphic

Summary of measurement results

Measurement axisBasePassiveACTIVE
ZBCG
XFEG
YFEG

Satisfactory intrinsic performance of the vibration isolation platform.

Horizontal floor vibration favorable at Class F, while vertical is relatively high at Class B.

In active isolation, the tabletop vibration environment is favorable at Class G or above.

OCTAVE BAND

Active Z

Active X

Active Y

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date12-29-2014
Tags
DVIA-M Series
Installation Report
DVIA-MB1000
MB1000
P8
FEI
SEM
Hanyang University
College of Engineering