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Installation Report
DVIA-M Series
08-19-2024

TESCAN Solaris X FIB-SEM DVIA-ML1000 Installation Report

DVIA-M Series
Installation Report
TESCAN
Tier-1 Semiconductor

Vibration Isolation System Info

Model: DVIA-ML1000

Serial Number: 240403R2

Engineer

Chaewon Lee

Tuning Date

August 09, 2024

Report written date

August 19, 2024

Installation Site

Tier-1 Semiconductor Future FIB Analyzing Lab

Equipment

Manufacturer: TESCAN

Equipment: FIB-SEM

Model: Solaris X

Equipment Status

The microscope was installed on the DVIA-ML1000 platform.

Number of Tuning Trial

1st

Measurement Device

8.1) Brüel & Kjær LAN-XI DAQ Type 3050

-Hardware: B&K Front End Type 3050-A-040

-Software: B&K Pulse Labshop 22 Version

8.2) Accelerometer

PCB Accelerometer

Model: 393B05

Measurement Setup

Bandwidth: 200 Hz

Lines: 800

Averaging: Spectrum Averaging

Engineering Units: m/s

Window: Hanning

Overlap: Max

Vibration Specification

<10 um/s below 30 Hz, <20 um/s above 30 Hz

Conclusion

After the installation of the DVIA-ML1000, floor vibration was reduced to within the vibration specification in all axes.

Measurement Summary

Measurement PointStatusAxisVibration SpecificationMeasurement DataResult
FloorDVIA-ML1000FloorDVIA-ML1000
FIB LAB
1. Floor
2. DVIA-ML1000
Microscope is installed and is in operation.Vertical10 um/s @ 1 - 30 Hz1.22E-05 m/s @ 2.5 Hz1.23E-06 m/s @ 2.5 HzFAILPASS
20 um/s @ 30 - 100 Hz1.76E-05 m/s @ 31.5 Hz1.33E-06 m/s @ 31.5 HzPASSPASS
Left to Right10 um/s @ 1 - 30 Hz1.27E-05 m/s @ 1.25 Hz1.34E-06 m/s @ 1.25 HzFAILPASS
20 um/s @ 30 - 100 Hz2.24E-06 m/s @ 63 Hz3.74E-07 m/s @ 63 HzPASSPASS
Front to Back10 um/s @ 1 - 30 Hz8.40E-06 m/s @ 1.25 Hz5.60E-07 m/s @ 1.25 HzPASSPASS
20 um/s @ 30 - 100 Hz1.76E-06 m/s @ 63 Hz1.28E-07 m/s @ 63 HzPASSPASS

Data and Image

Vertical VC Curves

Vertical Narrow Band

Vertical Transmissibility

Left to Right VC Curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Reference

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date08-19-2024
Tags
DVIA-M Series
Installation Report
TESCAN
Tier-1 Semiconductor