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Installation Report
DVIA-M Series
05-11-2026

Fuchuang Precision Semiconductor ZEISS Sigma 360 FE-SEM DVIA-ML1000 (260203R3) Installation Report

DVIA-M Series
Installation Report
Fuchuang Precision Semiconductor
ZEISS
Sigma 360
FE-SEM
DVIA-ML1000
260203R3
Beijing

Prepared by

Engineer: Juhyeok Kim

Tuning date: 26.05.08

Report written date: 26.05.11

Overview

The DVIA-ML1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ML1000

Serial Number: 260203R3

Engineer

Juhyeok Kim DAEIL SYSTEMS

Tuning Date

May 8, 2026

End User

Fuchuang Precision Semiconductor

Number of Tuning Trial

1st

Location

Beijing, China

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

Vibration Specification

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

N/A

Measurement Summary

Measurement PointStatusAxisVibrationSpecificationMeasurement Data(RMS, mm/s2)Result
FloorDVIA-ML1000FloorDVIA-ML1000
1.Floor
2.DVIA-ML1000
Equipment is Turned on/IDLEVerticalRefer to item 95.78
@ 24.14 Hz
0.0349
@ 24.14 Hz
FAILPASS
Left to Right0.00589
@ 2.87 Hz
0.000249
@ 2.87 Hz
PASSPASS
Front to Back0.0797
@ 2.52 Hz
0.00529
@ 2.52Hz
PASSPASS

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date05-11-2026
Tags
DVIA-M Series
Installation Report
Fuchuang Precision Semiconductor
ZEISS
Sigma 360
FE-SEM
DVIA-ML1000
260203R3
Beijing