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Installation Report
DVIA-P Series
06-11-2026

Huahong ASML eScan460 DVIA-P4000 Installation Report

DVIA-P Series
Installation Report
Huahong
Hua Hong Semiconductor
ASML
eScan460
E-beam Wafer inspection system
DVIA-P4000
251215R5

Overview

Following the installation of DVIA-P4000 at Hua hong FAB 9, tuning and vibration measurement were performed.

Vibration measurement was conducted with the Equipment installed and in the turned-on state.

Data is represented in VC Curve format, and reference material on the vibration level is provided.

Vibration Isolation System Information

Model: DVIA-P4000

Serial Number: 251215R5

Engineer

Chaewon Lee · DAEIL SYSTEMS

Tuning Date

May 28, 2026

End User

Hua Hong Semiconductor

Number of Tuning Trial

1st

Location

Hua Hong FAB 9

Equipment

Manufacturer: ASML

Equipment: E-beam Wafer inspection system

Model: eScan460

Vibration Specification

VC-D

Equipment Condition

Vibration measurement was performed with the customer's equipment installed but not operating.

Measurement Summary

Measurement PointVibration SpecificationsAxisResult
FloorDVIA-P4000
1. Floor
2. DVIA-P4000
VC-DVerticalFAILPASS
Left to RightFAILPASS
Front to BackPASSPASS

Data and Image

Vertical VC Curves

Left to Right VC Curves

Front to Back VC Curves

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-P Series
Date06-11-2026
Tags
DVIA-P Series
Installation Report
Huahong
Hua Hong Semiconductor
ASML
eScan460
E-beam Wafer inspection system
DVIA-P4000
251215R5