YIMO Huahong FAB 9 ASML E-beam Wafer inspection system eScan460 DVIA-P4000 Installation Report

DVIA-P Series

Installation Report

YIMO

Huahong

ASML

eScan460

E-beam Wafer inspection system

DVIA-P4000

240424R1

Vibration Isolation System Info

Model: DVIA-P4000

Serial Number: 240424R1

Engineer

Chaewon Lee

Tuning Date

2026-05-28

Installation Site

Huahong FAB 9

Equipment

Manufacturer: ASML

Equipment: E-beam Wafer inspection system

Model: eScan460

Equipment Status

The equipment was installed on the DVIA-4000 platform. IDLE

Number of Tuning Trial

2nd

Measurement Device

8.1) Data Physics DAQ

Hardware: QUATTRO, Serial Number: 22436

-Software: SignalCalc ACE

8.2) Accelerometer

PCB Accelerometer

Model: 393B05

Measurement Setup

Bandwidth: 200 Hz

Lines: 3200

Averaging: Spectrum Averaging

Engineering Units: m/s

Window: Hanning

Overlap: Max

Vibration Specification

VC-D

Conclusion

Based on the inspection results, DVIA-P4000 is operating normally. In addition, the measured vibration levels in all directions meet the required equipment vibration specifications.

Measurement Summary

Measurement Point	Position	Axis	Vibration Specification	Measurement Data	Result
Huahong FAB 9 1. Floor 2. DVIA-P4000	Floor	Vertical	VC-D	VC-C	✗ FAIL
	Floor	Left-Right	VC-D	VC-D	✓ Pass
	Floor	Front-Back	VC-D	VC-E	✓ Pass
	DVIA-P4000	Vertical	VC-D	VC-E	✓ Pass
	DVIA-P4000	Left-Right	VC-D	VC-F	✓ Pass
	DVIA-P4000	Front-Back	VC-D	VC-F	✓ Pass

Data & Image

Vertical VC Curves

Left to Right VC Curves

Front to Back VC Curves

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A