Installation Report

DVIA-M Series

02-07-2023

Oak Ridge National Laboratory Zeiss Gemini SEM 460 DVIA-MB1000 VEC (221013R2) Installation Report — 2023.02.07

DVIA-M Series

Installation Report

VEC

DVIA-MB1000

Oak Ridge National Laboratory

ORNL

ZEISS

Gemini SEM 460

221013R2

Prepared for

Toya Beiswenger PhD

Prepared by

Engineer: Hosang Yu Tuning date: 23.02.01 Report written date: 23.02.07 | Date of business trip : 17.12.27~17.12.29

Overview

The DVIA-MB1000 active vibration isolation platform is appropriately installed and functioning as intended.

System Information

Model: DVIA-MB1000-1000X1200X224H

Serial Number: 221013R2

Engineer: Hosang Yu from DAEIL SYSTEMS

Tuning Date: February 01, 2023

Location: Oak Ridge National Labs / 1 Bethel Valley Road Oak Ridge / Tennessee 378311

Equipment: Zeiss Gemini SEM 460

Data and Image

Z-axis (Vertical) Transmissibility with Stomping

Z-axis (Vertical) Floor VC Curve with Stomping

Z-axis (Vertical) Active VC Curve with Stomping

X-axis (Left to Right) Transmissibility

X-axis (Left to Right) Floor VC Curve

X-axis (Left to Right) Active VC Curve

Y-axis (Front to Back) Transmissibility

Y-axis (Front to Back) Floor VC Curve

Y-axis (Front to Back) Active VC Curve

Equipment Picture

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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