Skip to main content
Installation Report
DVIA-M Series
04-16-2021

LB Semicon TESCAN MIRA DVIA-MB1000 (MB1000 P220) Installation Report — 2021.04.16

DVIA-M Series
Installation Report
DVIA-MB1000
MB1000
P220
TESCAN
MIRA
LB Semicon

Contents

(MB1000_P220 테스칸-LB세미콤)

Target equipmentTESCAN-MIRA
Place of installationLB세미콤 2층 부설연구소
RemarkGood Performance
END USERLB세미콤
Operator: Choi, HyoungMunDate of business trip : 17.12.27~17.12.29
Date of setup : 21.04.16Date of reporting : 21.04.16

Equipment installation

Overview

After Active mounting, measure the vibration environment to check that there is no problem in using the equipment.

Measurement date: 21.04.16 (FRI)

Operator: Daeil System, Research engineer Choi, HyoungMun

Place of measurement : LB세미콤 2층 부설연구소

Equipment Model: TESCAN-MIRA

Measurement conditions and results

DAQ System : B&K PULSE 14 & LAN-XI Type 3056

Accelerometer : PCB PIEZOTRONICS 393B05

Frequency Range : 0.7 ~ 200Hz

Brüel & Kjær LAN-XI Type 3056

PCB Piezotronics 393B05 accelerometer

Brüel & Kjær PULSE LabShop

Summary of measurement results

Test ConditionVC-Class ZVC-Class XVC-Class Y
FloorACC
Above ActiveDEE

Good omnidirectional performance.

MB1000 internal program performance measurement result

Z axis

X axis

Y axis

Vibration Criterion Curve

Z-axis (Vertical) VC curves

X-axis (Left to Right) VC curves

Y-axis (Front to Back) VC curves

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)		Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

2. Detail size refers to width in microelectronics fabrication or particle size in medical research.

Share this Case Study

Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date04-16-2021
Tags
DVIA-M Series
Installation Report
DVIA-MB1000
MB1000
P220
TESCAN
MIRA
LB Semicon

Related Case Studies

Tier-1 Semiconductor TESCAN-FE SEM DVIA-MB1000 (MB1000 program) Installation Report — 2020.06.29
DVIA-M Series

Tier-1 Semiconductor TESCAN-FE SEM DVIA-MB1000 (MB1000 program) Installation Report — 2020.06.29

06-29-2020Read more
Tier-1 Semiconductor TESCAN-FE SEM DVIA-MB1000 (MB1000 program, P123) Installation Report — 2020.06.19
DVIA-M Series

Tier-1 Semiconductor TESCAN-FE SEM DVIA-MB1000 (MB1000 program, P123) Installation Report — 2020.06.19

06-19-2020Read more
TESCAN AMBER DVIA-MB1000 (P161) Internal Program Performance — 2020.06.17
DVIA-M Series

TESCAN AMBER DVIA-MB1000 (P161) Internal Program Performance — 2020.06.17

06-17-2020Read more