Installation Report

DVIA-M Series

09-10-2019

Wenzhou Hongfeng Electric Alloy Hitachi SU1510 DVIA-MB1000 (190812R6) Installation Report — 2019.09.10

DVIA-M Series

Installation Report

DVIA-MB1000

Hitachi

SU1510

Wenzhou

190812R6

Target equipment

Hitachi SU1510

Place of installation

F3, Wenzhou Hongfeng electric alloy

Remark

Good Performance

END USER

Wenzhou Hongfeng electric alloy

Operator

Choi, Sung Won

Date of setup

19.09.05

Date of reporting

19.09.10

Date of business trip

17.12.27~17.12.29

Overview

After Active mounting, measure the vibration environment to check that there is no problem in using the equipment.

Measurement date: 2019.09.05 (Thursday),

Operator: Daeil System, Manager Sung Won Choi

Place of measurement : F3, Wenzhou Hongfeng electric alloy

Equipment Model: Hitachi SU1510

Measurement conditions and results

Summary of measurement results

Test Condition	Z	X	Y
Floor	C	C	C
Above Active	F	F	F

Good omnidirectional performance.

MB1000 internal program performance measurement result

Z axis (MB1000 internal program)

X axis (MB1000 internal program)

Y axis (MB1000 internal program)

Octave Band Result (BASE: Floor, TOP: Above Active)

Z axis (octave band)

X axis (octave band)

Y axis (octave band)

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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