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Installation Report
DVIA-M Series
06-12-2014

Seoul National University — ZEISS Gemini M-1000 P3 vibration environment measurement (2014-06-12)

DVIA-M Series
Installation Report
M1000 P3
Seoul National University
Carl Zeiss
ZEISS Gemini
Vibration measurement

Vibration environment measurement results (Seoul National University Precision Machinery Joint Research Building)

Overview

To determine whether the vibration environment after applying the M-1000 P3 isolation platform satisfies the user's requirements.

Measurement date: 2014. 6. 12 (Thursday). Measurer: Choi Seong-won.

3. Measurement conditions and results

Carl Zeiss host equipment was operating during tuning and vibration measurement.

Measurement locations were the side of the isolation platform top plate (top) and the floor near the platform base (base).

Measurement setup — photograph 1

Measurement setup — photograph 2

Results summary

Test directionBaseTopTransmissibility [dB @ 10 Hz]
ACTIVE ZDG-30.8
ACTIVE XEG-34.7
ACTIVE YFG-34.3

Isolation platform intrinsic performance is satisfactory at approximately −30 dB in all directions.

With active control, the vibration environment on the platform top is G class and satisfactory.

The SEM's built-in passive isolation may affect performance in the 1–6 Hz range; the measurement results confirm this is not an issue.

Transmissibility graphs

Transmissibility (Z and X axes)

Transmissibility (Y axis)

Octave band

Octave band (Active Z and Active X)

Octave band (Active Y)

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date06-12-2014
Tags
DVIA-M Series
Installation Report
M1000 P3
Seoul National University
Carl Zeiss
ZEISS Gemini
Vibration measurement