Hitachi SU8010 SEM DVIA-MB1000 Installation

Installation Report

DVIA-M Series

Hitachi

1. Measurement Details

Measurement Date: April 6, 2016

Measurement Devices:

LAN-XI Data Acquisition Hardware – Brüel & Kjær 3050-B-040

Data Analysis Software – Brüel & Kjær PULSE LAB SHOP 14

Sensors – PCB Accelerometer Model: 393B05

Measurement Location: 5th Floor

Measurement Setup:

Bandwidth: 0 – 100 Hz

Lines: 400

Window: Hanning

Averaging: Fast Fourier Transform Spectrum Averaging

Amplitude Units: m/s²

Spectral Unit: RMS

Manufacturer: HITACHI

Model: SEM SU8010

Floor Vibration Specification: VC-E

Model: DVIA-MB1000

Specification	Value
Platform Dimensions	Custom-made
Load Capacity	500 - 1700 kg
Actuator	Electromagnetic Actuator
Maximum Actuator Force	Vertical: 40N, Horizontal: 20 N
Degrees of Freedom	6 degrees
Active Isolation Range	0.5 - 100 Hz
Vibration Isolation at 1 Hz	≥90%
Input Voltage	AC100 - 240V / 50 - 60 Hz / 1A
Power Consumption	Maximum 110W, <50 W in normal operation
Operating Temperature	5 - 50 °C
Operating Humidity	20 - 90%
Required Air Pressure	≥ 0.5 MPa (5 bar)

The active vibration isolation system reduced the vertical floor vibration from VC-B to VC-E.

The active vibration isolation system reduced the X-axis floor vibration from VC-C to VC-F.

The active vibration isolation system reduced the Y-axis floor vibration from VC-B to VC-F.

HV: 15.00 kV / Mag: 100,000x / Linewidth: 500 nm

HV: 30.00 kV / Mag: 100,000x / Linewidth: 500 nm

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A