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Installation Report
DVIA-ULF Series
07-06-2026

Korea Institute of Science and Technology TESCAN Clara FE-SEM DVIA-ULFB700 Installation Report

DVIA-ULF Series
Installation Report
Korea Institute of Science and Technology
TESCAN
Clara
FE-SEM
DVIA-ULFB700
260227R2

Overview

A revisit was made to inspect the equipment due to noise generated when opening and closing the upper equipment door at Korea Institute of Science and Technology, Building L0, Room 184.

Inspection and vibration measurement were performed with the equipment installed and in the Turned on/IDLE state.

The data is presented in VC Curve format, together with reference material on the corresponding vibration levels.

Vibration Isolation System Information

Model: DVIA-ULFB700

Serial Number: 260227R2

Engineer

Dongkyu Park, DAEIL SYSTEMS

Tuning Date

June 18, 2026

Installation Site

Korea Institute of Science and Technology, Building L0, Room 184

End User

Korea Institute of Science and Technology

Equipment

Manufacturer: TESCAN

Equipment: FE-SEM

Model: Clara

Vibration Specification

Frequency [Hz]Vibration Spec [µm/s RMS]
3010
10020

Equipment Condition

Equipment installed and Turned on/IDLE

Measurement Equipment

10.1) Measurement Equipment

Hardware: B&K Front End Type 3040-A-040

Software: B&K Pulse Labshop2 2 Version

10.2) Accelerometer

PCB 393B05

Measurement Setup

F Span: 200 Hz

Lines: 2400

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Conclusion

The cause of the noise generated when opening and closing the upper equipment door was identified as noise produced by the spring contacting the groove of the top plate.

Although the noise occurs, it was determined that there is no issue with performance or use.

There is a section where larger vibration occurs at the top due to airflow generated by the equipment, but all X, Y, and Z axes met the required specification.

Measurement Summary

Measurement PointVibration SpecificationAxisFloorDVIA-ULFB700
1. Floor
2. DVIA-ULFB700
See Section 8Vertical (Z-axis)PASSPASS
Left to Right (X-axis)PASSPASS
Front to Back (Y-axis)PASSPASS

Data and Image

Z-axis Autospectrum

Z-axis VC Curves

X-axis Autospectrum

X-axis VC Curves

Y-axis Autospectrum

Y-axis VC Curves

Reference

The table below classifies vibration levels based on IEST-RP-CC012.2.

Criterion CurveDescriptionAmplitude (μm/s) (μin/s)Detail Size (μm)
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances. Usually adequate for computer equipment, hospital recovery rooms, semiconductor probe test equipment, and microscopes less than 40x.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable in most instances for surgical suites, microscopes to 100x and for other equipment of low sensitivity.100 (4,000)25
VC-AAdequate in most instances for optical microscopes to 400x, microbalances, optical balances, proximity and projection aligners, etc.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment (including steppers) to 3μm line widths.25 (1,000)3
VC-CAppropriate standard for optical microscopes to 1000x, lithography and inspection equipment (including moderately sensitive electron microscopes) to 1μm detail size. TFT-LCD stepper/scanner processes.12.5 (500)1-3
VC-DSuitable in most instances for demanding equipment, including many electron microscopes (SEMs and TEMs) and E-Beam systems.6.25 (250)0.1-0.3
VC-EA challenging criterion to achieve. Assumed to be adequate for the most demanding of sensitive systems including long path, laser-based, small target systems, E-Beam lithography systems working at nanometer scales, and other systems requiring extraordinary dynamic stability.3.12 (125)< 0.1
VC-FAppropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.1.56 (62.5)N/A
VC-GAppropriate for extremely quiet research spaces; generally difficult to achieve in most instances, especially cleanrooms. Not recommended for use as a design criterion, only for evaluation.0.78 (31.3)N/A

Notes:

1. As measured in one-third octave bands of frequency over the frequency 8 to 80 Hz (VC-A and VC-B) or 1 to 80 Hz (VC-C through VC-G).

2. The detail size refers to the width in the case of microelectronics fabrication, the particle (cell) size in the case of medical and pharmaceutical research, etc.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date07-06-2026
Tags
DVIA-ULF Series
Installation Report
Korea Institute of Science and Technology
TESCAN
Clara
FE-SEM
DVIA-ULFB700
260227R2