Installation Report

DVIA-M Series

01-13-2026

ZEISS Sigma 300 FE-SEM DVIA-ML1000 Installation Report (YIMO, 2026-01-13)

DVIA-M Series

Installation Report

YIMO

ZEISS

Sigma 300

FE-SEM

DVIA-ML1000

Overview

The DVIA-ML1000 active isolation platform is appropriately installed and functioning as intended.

1st tuning. ZEISS Sigma 300 FE-SEM, serial 250923R2; the equipment is turned on/IDLE.

YIMO-format report; end user and installation site: N/A.

Vibration Isolation System Information

Model: DVIA-ML1000 — Serial: 250923R2

Engineer

Chaewon Lee — DAEIL SYSTEMS

Tuning date

January 13, 2026

Report written date

January 13, 2026

End user

N/A

Number of tuning trial

1st

Location

N/A

Equipment

Manufacturer: ZEISS — FE-SEM — Model: Sigma 300

Vibration specification

The field report provides an allowable-vibration diagram for the FE-SEM (manufacturer / customer spec).

Allowable vibration diagram

Equipment condition

The equipment is turned on/IDLE

Tuning request

N/A

Data and Image

Vibration specification graphic (above) and, from the UI program, for each of Vertical, Left to Right, and Front to Back, Autospectrum and Transmissibility, plus the equipment picture.

Vertical Autospectrum

Vertical Transmissibility

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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