Installation Report

DVIA-M Series

10-04-2022

Zeiss Sigma300 DVIA-M1000 Installation Report (XINSTEEL / Xinyu, 220812R3, 2022)

DVIA-M Series

Installation Report

DVIA-M1000

Zeiss

Sigma300

XINSTEEL

Xinyu

220812R3

End user (cover)

XINSTEEL

Platform title

(M1000_ 220812R3 Set up)

Set-up photograph

Target equipment

Zeiss Sigma300

Place of installation

Xinyu

Remark

Good Performance

End user (table)

XINSTEEL

Operator

Yu, Ho Sang

Date of setup

22.09.14

Date of reporting

22.10.04

Date of business trip

17.12.27~17.12.29

Overview

The DVIA-M1000 active vibration isolation platform is appropriately installed and functioning as intended.

Measurement date

2022.09.14 (Wednesday)

Operator (measurement)

DAEIL SYSTEMS, Hosang Yu

Place of measurement

Xinyu

Equipment model

Zeiss Sigma300

Measurement conditions and results

Summary of measurement results

Test Condition	Z	X	Y
Floor	C	B	C
Above Active	G	G	E

Good omnidirectional performance.

MB1000 internal program performance measurement result

Z axis

X axis

Y axis

Octave Band Result

Z axis

X axis

Y axis

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A