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Installation Report
DVIA-M Series
08-03-2022

ZEISS SIGMA500 (Qingdao) DVIA-ML1000 Installation Report (SN 220308R4, Aug 2022)

DVIA-M Series
Installation Report
ZEISS
SIGMA500
Qingdao
DVIA-ML1000
220308R4

Target equipment

ZEISS SIGMA500

Place of installation

QINGDAO

Remark

Good Performance

End user

青岛蓝谷微纳

Operator

Cheon, Seoung hoon

Date of setup

22.08.01

Date of reporting

22.08.03

Date of business trip

17.12.27~17.12.29

Overview

The DVIA-M1000 active vibration isolation platform is appropriately installed and functioning as intended.

Measurement conditions and results

Measurement date: 2022.08.01 (Monday),

Operator: DAEIL SYSTEMS, Seounghoon Cheon, Youngha Lee

Place of measurement: QINGDAO

Equipment Model: ZEISS SIGMA500

Summary of measurement results

Test Condition VC-ClassZXY
FloorEFF
Above ActiveGFF

Good omnidirectional performance.

Data and Image

Instrumentation setup

MB1000 internal program — Z axis

MB1000 internal program — X axis

MB1000 internal program — Y axis

Octave band result — Z axis

Octave band result — X axis

Octave band result — Y axis

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-M Series
Date08-03-2022
Tags
DVIA-M Series
Installation Report
ZEISS
SIGMA500
Qingdao
DVIA-ML1000
220308R4