Installation Report

DVIA-M Series

07-12-2022

Zeiss Gemini SEM360 DVIA-ML1000 Installation Report (220307R1)

DVIA-M Series

Installation Report

Universal Scientific Industrial

USI

Zeiss

Gemini SEM360

SEM

Shanghai

DVIA-ML1000

DVIA-M1000

220307R1

Target equipment

Zeiss Gemini SEM360

Place of installation

Shanghai

Remark

Good Performance

End user

Universal Scientific Industrial Co., Ltd.（环旭电子）

Reporting

Operator: Cheon, Seoung hoon

Date of setup: 22.07.11

Date of reporting: 22.07.12

Date of business trip

17.12.27~17.12.29

Overview

The DVIA-M1000 active vibration isolation platform is appropriately installed and functioning as intended.

Measurement date

2022.07.11 (Monday)

Operator

DAEIL SYSTEMS, Seounghoon Cheon, Youngha Lee

Place of measurement

Shanghai

Equipment Model

Zeiss Gemini SEM360

Measurement conditions and results

Summary of measurement results

Test Condition	Z	X	Y
Floor	A	B	B
Above Active	F	E	F

Good omnidirectional performance.

MB1000 internal program performance measurement result

Vertical VC Curves

Left to Right VC Curves

Front to Back VC Curves

Octave Band Result

Vertical octave band result

Left to Right octave band result

Front to Back octave band result

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

Share this Case Study

Case Study Information

Related Case Studies

DVIA-M Series

Shanghai Aladdin Biochemical Regulus8100 DVIA-M1000 setup report — Shanghai (DVIA-M1000, SN 211220R1)

10-21-2022Read more

DVIA-M Series

LASENSOR SEM5000 DVIA-M1000 Setup Report — Shanghai measurement (DVIA-M1000, SN 220726R5)

10-21-2022Read more

DVIA-M Series

YIMO Zeiss FE-SEM Sigma360 DVIA-M1000 (250102R2-4) Installation Report

04-18-2025Read more