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Installation Report
DVIA-ULF Series
10-30-2024

Tier-1 Semiconductor DVIA-U850 (230724R1) service report — Cheonan facility

DVIA-U Series
Installation Report
Tier-1 Semiconductor
DVIA-U850
230724R1
Cheonan

Overview

Following a relocation from I&I (Suwon) to the Tier-1 Semiconductor Cheonan site, DVIA-U850 platform service was requested regarding Left-to-Right / Front-to-Back behaviour above roughly 5–6 Hz; the October 8 visit did not reproduce 5–6 Hz peaks but documented elevated ~20 Hz floor vibration and reduced performance; a revisit on October 25 addressed these items.

Cable tension influencing the isolation top plate was relaxed; powering off the isolator-area fan attenuated ~20 Hz energy.

At the customer’s request, settling-time characterization and vibration runs under representative main-tool motion (Align / PBI / BLT modes; 0.05 G and 0.2 G low-stroke excitation) were added.

Engineer: Seong-Yoon Jeong · measurement date: 2024-10-25 · report written: 2024-10-30 (per worksheet).

Engineer

DAEIL SYSTEMS: Daehyun Kim (manager), Seong-Yoon Jeong (engineer)

Measurement Date

October 25, 2024

Installation Site

Tier-1 Semiconductor Cheonan Plant 1, 5th floor line

Measurement Equipment

10.1) Data Physics — Hardware: QUATTRO DP240; Software: SignalCalc ACE

10.2) Accelerometer — PCB 393B05

Measurement Setup

F Span: 200

Lines: 3200

Window: Hanning

Averaging: FFT Spectrum Averaging

Engineering Units: m/s²

Equipment vibration specification

VC-C (or two VC-class reduction per worksheet wording).

Conclusions

8.1) Issues. On October 8, stage rest exhibited ~20 Hz floor-related vibration signatures, degraded performance versus the VC intent, and specification non-compliance trends. Requests added settling-time characterization and vibrations under Align / PBI / BLT motions at 0.05 G and 0.2 G stroke.

8.2) Analysis / corrective path. Measurements singled out upper-deck airflow hardware; fan shutdown and relieving cable lash reduced coupling. Post-change transmissibility confirmed nominal isolator control. Suwon-vs-Cheonan comparative traces remain on file alongside this dataset; additional structural decoupling stayed with the fabsite owner per their scope statement.

Measurement results summary

Authoritative Pass/Fail and mixed-band cells follow the plots in Data and Images; tables below condense the onsite worksheets.

### 9.1 Isolator Active On (condensed)

ConditionSiteAxisSpecificationMeasurementJudgement
Main-machine Off / Fan ON / ties onDVIA-U850Vertical (Z)VC-CVC-DPASS
DVIA-U850Left–right (X)VC-BN/AFAIL
DVIA-U850Front–back (Y)VC-CN/APASS
FloorVertical (Z)VC-BN/AFAIL
FloorLeft–right (X)VC-BN/AFAIL
FloorFront–back (Y)VC-CN/APASS
Main-machine Off / Fan OFF / ties removedDVIA-U850Vertical (Z)VC-CVC-DPASS
DVIA-U850Left–right (X)VC-E @ >2 Hz / VC-B @ <2 HzCurvePASS / FAIL
DVIA-U850Front–back (Y)VC-E @ >2 Hz / VC-C @ <2 HzCurvePASS / PASS
FloorVertical (Z)VC-BN/AFAIL
FloorLeft–right (X)VC-BCurvePASS
FloorFront–back (Y)VC-CN/APASS
Main-machine On / Fan OFF / ties removedDVIA-U850Vertical (Z)VC-CVC-DPASS
DVIA-U850Left–right (X)VC-D @ >2 Hz / VC-B @ <2 HzCurvePASS / FAIL
DVIA-U850Front–back (Y)VC-C @ >2 Hz / VC-B @ <2 HzCurvePASS / FAIL
FloorVertical (Z)VC-AN/AFAIL
FloorLeft–right (X)VC-BN/AFAIL
FloorFront–back (Y)VC-BN/AFAIL
Before relocation (Suwon) / Tool OffDVIA-U850Vertical (Z)VC-CVC-EPASS
DVIA-U850Left–right (X)N/AVC-FPASS
DVIA-U850Front–back (Y)N/AVC-FPASS
FloorVertical (Z)VC-BN/AFAIL
FloorLeft–right (X)VC-BN/AFAIL
FloorFront–back (Y)VC-BN/AFAIL

### 9.2 Settling time bullets

Summaries track the onsite tables: Align 0.05 G Y achieves ≤0.3 s on all repeats; Align 0.2 G Y fails across repeats; PBI 0.05 G clears Z repeats while Y shows mixed repeats; PBI 0.2 G records mixed Z draws and Y draws with source dash entries; BLT 0.05 G shows mixed Z draws with all X passes; BLT 0.2 G passes every Z and X draw.

Data and Images

10.1. Vibration isolation performance (isolator Active On)

Condition: Main machine off, platform top fan ON, cable ties not removed

Vertical (Z) (1/3)

Vertical (Z) (2/3)

Vertical (Z) (3/3)

Left to right (X) (1/3)

Left to right (X) (2/3)

Left to right (X) (3/3)

Front to back (Y) (1/3)

Front to back (Y) (2/3)

Front to back (Y) (3/3)

Condition: Main machine off, platform top fan OFF, cable ties removed

Vertical (Z) (1/4)

Vertical (Z) (2/4)

Vertical (Z) (3/4)

Vertical (Z) (4/4)

Left to right (X) (1/5)

Left to right (X) (2/5)

Left to right (X) (3/5)

Left to right (X) (4/5)

Left to right (X) (5/5)

Front to back (Y) (1/3)

Front to back (Y) (2/3)

Front to back (Y) (3/3)

Condition: Main machine on, platform top fan OFF, cable ties removed

Vertical (Z) (1/3)

Vertical (Z) (2/3)

Vertical (Z) (3/3)

Left to right (X) (1/3)

Left to right (X) (2/3)

Left to right (X) (3/3)

Front to back (Y) (1/3)

Front to back (Y) (2/3)

Front to back (Y) (3/3)

Condition: Previous install site (Suwon), customer tool turned off

VC-curve (1/3)

VC-curve (2/3)

VC-curve (3/3)

Transmissibility

10.2. Settling time

Condition: Align, 0.05 G — Y direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Condition: Align, 0.2 G — Y direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Condition: PBI, 0.05 G — Y direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Condition: PBI, 0.05 G — Z direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Condition: PBI, 0.2 G — Y direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Condition: PBI, 0.2 G — Z direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Condition: BLT, 0.05 G — Z direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Condition: BLT, 0.05 G — X direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Condition: BLT, 0.2 G — Z direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Condition: BLT, 0.2 G — X direction

Round 1 — capture (1/2)

Round 1 — capture (2/2)

Round 2 — capture (1/2)

Round 2 — capture (2/2)

Round 3 — capture (1/2)

Round 3 — capture (2/2)

Reference

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date10-30-2024
Tags
DVIA-U Series
Installation Report
Tier-1 Semiconductor
DVIA-U850
230724R1
Cheonan