Installation Report

DVIA-ULF Series

04-10-2026

East China University of Science and Technology ZEISS Sigma 360 DVIA-ULF700 Installation Report

DVIA-ULF Series

Installation Report

ZEISS

Sigma 360

ECUST

Overview

The DVIA-ULF700 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ULF700

Serial Number: 251224R5

Engineer

Chaewon Lee DAEIL SYSTEMS

Report written date: April 13, 2026

Tuning Date

April 10, 2026

End User

East China University of Science and Technology

Number of Tuning Trial

1st

Location

Shanghai, China

Equipment

Manufacturer: ZEISS

Equipment: FE-SEM

Model: Sigma 360

Vibration Specification

Equipment Condition

The equipment is turned on/IDLE

Tuning Request

Measurement Summary

Measurement Point	Status	Axis	Vibration Specification	Floor (RMS, mm/s²)	DVIA-ULF700 (RMS, mm/s²)	Floor	DVIA-ULF700
1. Floor 2. DVIA-ULF700	Equipment is Turned on/IDLE	Vertical	Refer to item 9	0.224 @ 24.75 Hz	0.00176 @ 24.75 Hz	✗ FAIL	✓ PASS
		Left to Right		0.103 @ 2.52 Hz	0.0092 @ 2.52 Hz	✗ FAIL	✓ PASS
		Front to Back		0.146 @ 2.35 Hz	0.01 @ 2.35 Hz	✗ FAIL	✓ PASS

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

1

2

Reference

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

*Notes:*

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

YIMO ZEISS Sigma 360 FE-SEM DVIA-ULF700 Installation Report (retuning after degraded performance)

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