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Installation Report
DVIA-ULF Series
01-13-2026

Tier-1 Semiconductor Fabrication Facility DSR C Tower 3F Research Lab ZEISS GeminiSEM 460 DVIA-ULF1000 Installation Report

DVIA-ULF Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
ZEISS

Overview

Tuning and vibration measurements were completed for the DVIA-ULF1000 installed at Tier-1 Semiconductor Fabrication Facility DSR C Tower, 3rd floor research laboratory.

Tuning and vibration measurements were performed with the equipment Turned on/IDLE.

Measurement data are presented as VC curves, with reference material for vibration level criteria.

Vibration Isolation System Information

Model: DVIA-ULF1000

Serial Number: 251112R4

Engineer

Chaewon Lee, Field Engineer, DAEIL SYSTEMS

Measurement Date

January 8, 2026

Measuring Location

Tier-1 Semiconductor Fabrication Facility DSR C Tower, 3rd floor research laboratory

End User

Tier-1 Semiconductor Fabrication Facility

Equipment Information

Manufacturer: ZEISS

Equipment: FE-SEM

Model: GeminiSEM 460

Equipment specification

Equipment Status

장비 설치 및 Turned on/IDLE

Measuring Equipment

Data Physics DAQ

Hardware: QUATTRO, Serial Number: 22436

Software: SignalCalc ACE

Accelerometer

PCB Accelerometer

Model: 393B05

Measuring Set-up

F Span: 200 Hz

Lines: 3200

Engineering Units: m/s

Window: Hanning

Averaging: FFT Spectrum Averaging

Averaging mode: Exponential, 40

Conclusion

Vibration specifications are satisfied in all directions.

Measurement Data

Measuring PointStatusDirectionFloorDVIA-ULF1000FloorDVIA-ULF1000
Tier-1 Semiconductor Fabrication Facility DSR C Tower 3F
Research Lab
1. Floor vibration
2. DVIA-ULF1000
Turned on/IDLEVerticalVC-B
@ 10 Hz
VC-G
@ 10 Hz
FAILPASS
Left to RightVC-D
@ 8 Hz
VC-F
@ 8 Hz
PASSPASS
Front to BackVC-E
@ 16 Hz
VC-F
@ 16 Hz
PASSPASS

Data and Image

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC Curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

Notes:

1. VC-A/B is measured in 1/3 octave bands from 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date01-13-2026
Tags
DVIA-ULF Series
Installation Report
Tier-1 Semiconductor Fabrication Facility
ZEISS