Installation Report

DVIA-ULF Series

09-23-2025

Huasheng Lianying YF-1801 DVIA-ULF1000 Installation Report

DVIA-ULF Series

Installation Report

YIDONG

Huasheng Lianying

Overview

The DVIA-ULF1000 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ULF1000

Serial Number: 250813R2

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

September 23, 2025

End User

Huasheng Lianying Vibration Damping Platform

Number of Tuning Trial

1st

Location

Wuxi, China

Equipment

Manufacturer: YIDONG

Equipment: FE-SEM

Model: YF-1801

Equipment Condition

The equipment is installed/Turned off

Tuning Request

Measurement Summary

Measurement Point	Status	Axis	Measurement Data
Measurement Point	Status	Axis	Floor	DVIA-ULF1000
1.Floor 2.DVIA-ULF1000	YF-1801 is Installed/Turned off	Vertical	VC-A @ 20 Hz	VC-G @ 20 Hz
		Left to Right	VC-D @ 2.5 Hz	VC-F @ 2.5 Hz
		Front to Back	VC-D @ 6.3 Hz	VC-G @ 6.3 Hz

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

Equipment picture

Reference

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

*Notes:*

1. VC-A/B is measured in one-third octave bands over 8-80 Hz, VC-C through VC-G from 1-80 Hz.

2. Detail size refers to line widths in microelectronics manufacturing or particle sizes in medical research.

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DVIA-ULF1000 YIMO Huasheng Lianying YF-1801 Installation Report (250813R2, Dec 2025)

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