Installation Report

DVIA-ULF Series

03-10-2026

Semilab AFM-2000 DVIA-ULFB350 Installation Report

DVIA-ULF Series

Installation Report

Semilab

AFM

Overview

The DVIA-ULFB350 active vibration isolation platform is appropriately installed and functioning as intended.

Vibration Isolation System Information

Model: DVIA-ULFB350

Serial Number: 250414R2

Engineer

Chaewon Lee DAEIL SYSTEMS

Tuning Date

March 10, 2026

End User

Semilab

Number of Tuning Trial

1st

Location

N/A

Equipment

Manufacturer: Semilab

Equipment: Automated AFM

Model: AFM-2000

Vibration Specification

N/A

Equipment Condition

The equipmen is turned on/IDLE

Measurement Summary

Measurement Point	Status	Axis	Floor	DVIA-ULFB350
1.Floor 2.DVIA-ULFB350	Equipment is Turned on/IDLE	Vertical	VC-C @ 6.3 Hz	VC-G @ 6.3 Hz
		Left to Right	VC-E @ 10 Hz	VC-G @ 10 Hz
		Front to Back	VC-E @ 8 Hz	VC-G @ 8 Hz

Measurement Data Obtained via UI Program

Vertical VC Curves

Vertical Autospectrum

Vertical Transmissibility

Left to Right VC Curves

Left to Right Autospectrum

Left to Right Transmissibility

Front to Back VC Curves

Front to Back Autospectrum

Front to Back Transmissibility

13. Reference

Criterion Curve	Description	Amplitude µm/s (µin/s)	Detail Size µm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

*Notes:*

As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

Detail size refers to width in microelectronics fabrication or particle size in medical research.

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