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Installation Report
DVIA-ULF Series
06-09-2023

ARCHE Semilab AFM-2000 DVIA-UB350 Installation Report

DVIA-ULF Series
Installation Report
Semilab
ARCHE
AFM

Prepared for

SEMILAB

Overview

The DVIA-UB350 active vibration isolation platform is appropriately installed and functioning as intended.

System Information

Model: DVIA-UB350

Serial Number: 220621R1

Engineer: Youngha Lee, DAEIL SYSTEMS

Tuning date: June 08, 2023

Report written date: June 09, 2023

Date of business trip: December 27–29, 2017

Location: ARCHE, 147, Annyeong-gil, Byeongjeom-gu, Hwaseong-si, Gyeonggi-do, Republic of Korea

Equipment: AFM-2000

Summary of vibration measurement results

Idle-condition measurement

Measurement PointZ-axis (Vertical) 1–10 HzZ-axis (Vertical) 12.5–80 HzX-axis (Left to Right) 1–10 HzX-axis (Left to Right) 12.5–80 HzY-axis (Front to Back) 1–10 HzY-axis (Front to Back) 10–80 Hz
FloorCCFFFF
Active (DVIA-UB350)GGGGGG

Enclosure-door disturbance measurement

Measurement PointZ-axis (Vertical) 1–10 HzZ-axis (Vertical) 12.5–80 HzX-axis (Left to Right) 1–10 HzX-axis (Left to Right) 12.5–80 HzY-axis (Front to Back) 1–10 HzY-axis (Front to Back) 10–80 Hz
FloorEDFFEE
Active (DVIA-UB350)FFEGFG

Data and Image

Z-axis (Vertical) Transmissibility

Z-axis (Vertical) VC-Curve graph — routine condition

Z-axis (Vertical) VC-Curve graph — enclosure-door disturbance

When ambient vibration was produced by opening and closing doors, low-frequency vibration on the isolator top plate increased but remained within VC-E; floor vibration did not increase while top-plate vibration did, suggesting interference from vibrations applied to the enclosure reaching the isolator top plate.

X-axis (Left to Right) Transmissibility

X-axis (Left to Right) VC-Curve graph — routine condition

X-axis (Left to Right) VC-Curve graph — enclosure-door disturbance

When ambient vibration was produced by opening and closing doors, vibration on the isolator top plate from 1–7 Hz increased but remained within VC-E; as with the Z-axis VC curve, floor vibration did not increase while top-plate vibration did, suggesting interference from vibrations applied to the enclosure reaching the isolator top plate.

Y-axis (Front to Back) Transmissibility

Y-axis (Front to Back) VC-Curve graph — routine condition

Y-axis (Front to Back) VC-Curve graph — enclosure-door disturbance

When ambient vibration was produced by opening and closing doors, vibration on the isolator top plate from 1–7 Hz increased but remained within VC-F; compared with the other axes, interference from ambient vibration sources appears relatively small.

Equipment installation picture

Acoustic enclosure exterior

Installation detail — cable tension and breadboard fastening (labeled ① and ②)

Installation improvements

Cable tension from the PC-to-equipment connection shown as item ① was strong, which could allow enclosure vibration to couple into the isolator top plate (equipment). Available slack should be increased to reduce cable tension.

During the site visit, a breadboard-mounted fixture used to limit equipment motion during transfer (item ②) was installed. Because enclosure vibration could couple into the isolator top plate (equipment), the engineer was asked to remove that fixture.

Reference

Generic Vibration Criteria

Criterion CurveDescriptionAmplitude
μm/s (µin/s)
Detail Size
μm
Workshop (ISO)Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.800 (32,000)N/A
Office (ISO)Perceptible vibration. Appropriate to offices and non-sensitive areas.400 (16,000)N/A
Residential Area (ISO)Barely perceptible vibration. Appropriate to sleep areas in most instances.200 (8,000)75
Operating Theatre (ISO)Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.100 (4,000)25
VC-AAdequate for optical microscopes to 400x, microbalances, optical balances.50 (2,000)8
VC-BAppropriate for inspection and lithography equipment to 3μm line widths.25 (1,000)3
VC-CAppropriate for optical microscopes to 1000x, lithography equipment to 1μm.12.5 (500)1 - 3
VC-DSuitable for demanding equipment including electron microscopes (SEMs/TEMs).6.25 (250)0.1 - 0.3
VC-EFor the most demanding systems including E-Beam lithography at nanometer scales.3.12 (125)< 0.1
VC-FFor extremely quiet research spaces. Not recommended as design criterion.1.56 (62.5)N/A
VC-GFor extremely quiet research spaces. Not recommended as design criterion.0.78 (31.25)N/A

*Notes:*

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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Case Study Information

Category
Installation Report
SeriesDVIA-ULF Series
Date06-09-2023
Tags
DVIA-ULF Series
Installation Report
Semilab
ARCHE
AFM