Installation Report

DVIA-M Series

12-20-2017

Beijing Tsinghua University ZEISS Crossbeam 340 DVIA-MB1000 (MB1000 P10) internal program — 2017.12.20

DVIA-M Series

Installation Report

Tsinghua University

Beijing

ZEISS

Crossbeam 340

DVIA-MB1000

MB1000

P10

Internal program

Customer and setup title

Beijing Tsinghua University, China (MB1000_P10 Set up)

Target equipment

ZEISS-Crossbeam 340

Place of installation

Tsinghua University laboratory, 7th floor, Beijing

Remark

Good isolator performance.

END USER

Tsinghua University doctoral student

Trip dates

17.12.17~17.12.19

Field engineer

Choi Hyoung Mun

Report written date

17.12.20

Overview

After installing the vibration isolation platform, the vibration environment was measured to verify that there is no problem in using the equipment.

Measurement date

Measurement date: 2017.12.218 (Mon), Measurer: DAEIL SYSTEMS Manager Choi Hyoung Mun

Place of measurement

Tsinghua University laboratory, 7th floor, Beijing

Equipment Model

ZEISS-Crossbeam 340

Measurement conditions and results

Summary of measurement results

Test Condition

VC-Class (general condition)

	Z	X	Y
Building floor	C	F	E
Isolator top plate	G	G	G

Omnidirectional performance is good, and VC-Class graphs are attached.

Measurements were taken under a general condition (SEM pumps running) and a routine condition (SEM/coater pumps running and people walking).

Even when the environment changes, such as surrounding pumps operating or people moving around, there is little effect on the vibration environment above the isolator.

The customer was satisfied with performance at the time of image measurement.

The final VC-Class values are stated with 50 Hz electrical noise excluded from the VC-Class assessment.

VC-Class curves

MB1000 internal program performance measurement result

Z axis

X axis

Y axis

Octave Band Result (BASE: Floor, TOP: isolator top)

Z axis (octave band)

X axis (octave band)

Y axis (octave band)

Reference

Generic Vibration Criteria

Criterion Curve	Description	Amplitude μm/s (µin/s)	Detail Size μm
Workshop (ISO)	Distinctly perceptible vibration. Appropriate to workshops and non-sensitive areas.	800 (32,000)	N/A
Office (ISO)	Perceptible vibration. Appropriate to offices and non-sensitive areas.	400 (16,000)	N/A
Residential Area (ISO)	Barely perceptible vibration. Appropriate to sleep areas in most instances.	200 (8,000)	75
Operating Theatre (ISO)	Vibration not perceptible. Suitable for surgical suites, microscopes to 100x.	100 (4,000)	25
VC-A	Adequate for optical microscopes to 400x, microbalances, optical balances.	50 (2,000)	8
VC-B	Appropriate for inspection and lithography equipment to 3μm line widths.	25 (1,000)	3
VC-C	Appropriate for optical microscopes to 1000x, lithography equipment to 1μm.	12.5 (500)	1 - 3
VC-D	Suitable for demanding equipment including electron microscopes (SEMs/TEMs).	6.25 (250)	0.1 - 0.3
VC-E	For the most demanding systems including E-Beam lithography at nanometer scales.	3.12 (125)	< 0.1
VC-F	For extremely quiet research spaces. Not recommended as design criterion.	1.56 (62.5)	N/A
VC-G	For extremely quiet research spaces. Not recommended as design criterion.	0.78 (31.25)	N/A

Notes:

- As measured in one-third octave bands over 8-80 Hz (VC-A/B) or 1-80 Hz (VC-C through VC-G).

- Detail size refers to width in microelectronics fabrication or particle size in medical research.

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